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, metal etching, metal acid etching metal chemical etching, chemical milling photo etching, chemical etching photochemical machining, photochemical etching
photo etched parts, photo milling
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metal etching, metal acid etching metal chemical etching, chemical milling

Metal etchings and metal acid etching including metal chemical etching, chemical milling, photo etching, chemical etchings, and photochemical machining.  

photo etching, chemical etching photochemical machining, photochemical etching   photo etched parts, photo milling
, metal etching, metal acid etching metal chemical etching, chemical milling photo etching, chemical etching photochemical machining, photochemical etching photo etched parts, photo milling ,

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ISO - International Organization
for Standardization

 

 

Acid – A substance that, when dissolved in water, forms a solution with a pH of less than seven.
 
Bend Lines – Lines that are partially etched into the surface of the metal, which aid in the bending of the part in a subsequent operation.
 
Burn-In – The process of heating a developed photoresist image until the resist coating becomes chemically resistant.
 
Chemical Blanking – A term originally used to refer to the process of photo chemical machining (PCM).
 
Chlorine Regeneration – A process in which ferric chloride acid is regenerated to maintain high quality acid for the etching process.
 
Coating – The dipping, rolling, spraying, laminating, spinning, printing or flowing of the substrate surface layer of a photoresist material in order to cover it with a resist.
 
Contact Printing – A photographic process in which an image is transferred from one substrate to another.
 
Conversion Coating – The subjection of a substrate surface to high temperatures or the pickling process in order to improve photoresistant adhesion.
 
Dry Film Resist – Photoresist in the form of rolled sheet laminate.
 
Etch Band Design – Designing artwork for parts to be photochemically machined so that all shapes are outlined with a controlled line to be etched.
 
Etchant – An acid used to dissolve a layer of metal to form the component.
 
Fret – A series of etched parts that are tagged into a frame. Blanks usually have several frets etched into them.
 
Halogen – Non-metallic elements fluorine, chlorine, bromine and iodine.
 
Intaglio – An image etched/sunk into the surface of a piece.
 
Ion – An electrically charged atom or group of atoms, the electrical charge of which results from a neutral atom or group of atoms losing or gaining one or more electrons.
 
Liquid Resist – A photoresist applied to the substrate by dipping, roller coating or spraying.
 
Photodiode – A device that receives optical power and changes it into an electrical signal.
 
Photoresist – A material that, when applied to any of a variety of substances, becomes sensitive to portions of the electromagnetic spectrum and, when properly exposed and developed, masks a portion of the material.
 
Spectral Sensitivity – The rate of response of a photographic material to a particular range of the electromagnetic spectrum.
 
Substrate – A structure that underlies and supports or forms base material on which coatings are applied.
 
Ultraviolet (UV) – Invisible electromagnetic radiation.

 

 
       
metal etching, metal acid etching
metal chemical etching, chemical milling
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photo etching, chemical etching